An Alternative Structure for Next Generation Regulatory Controllers and Scale-up of Copper(indium Gallium)selenide Thin Film Co-evaporative Physical Vapor Deposition Process

An Alternative Structure for Next Generation Regulatory Controllers and Scale-up of Copper(indium Gallium)selenide Thin Film Co-evaporative Physical Vapor Deposition Process

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1RTDA: Robustness, Tracking, Disturbance rejection, and overall Aggressiveness4.2 Level Control in a Lab-scale Four-Tank Process The process in question consists of four tanks and two pumps arranged as ... In general, the pumps can deliver water from the reservoir to all four overhead tanks at rates limited by the settings for valves V1-V4. ... Figure 4.1: Schematic diagram of the four-tank process.


Title:An Alternative Structure for Next Generation Regulatory Controllers and Scale-up of Copper(indium Gallium)selenide Thin Film Co-evaporative Physical Vapor Deposition Process
Author:Kapil Mukati
Publisher:ProQuest - 2007
ISBN-13:

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