Uwe F. W. Behringer, Semiconductor Equipment and Materials Institute. ... and review feature sizes below 1 OOnm (Fig. 6). ... software concept of the AfweTec CD tools provides a user friendly interface for operators (LMP) to navigate manually to the measurement locations. ... This approach is always ideal if only PCMs (Process Control Monitors) and no or only a few active structures are to be measured.
|Title||:||European Conference on Mask Technology for Integrated Circuits and Microcomponents|
|Author||:||Uwe F. W. Behringer, Semiconductor Equipment and Materials Institute. Europe|
|Publisher||:||Society of Photo Optical - 2003|